Wet chemical deposited ITO coatings on flexible substrates for organic photodiodes
Identifieur interne : 003575 ( Main/Repository ); précédent : 003574; suivant : 003576Wet chemical deposited ITO coatings on flexible substrates for organic photodiodes
Auteurs : RBID : Pascal:10-0167053Descripteurs français
- Pascal (Inist)
- Revêtement chimique, Photodiode, Addition étain, Addition indium, Impression, Ethylène téréphtalate polymère, Ethylène naphtalate copolymère, Nanoparticule, Nanomatériau, Résistivité couche, Effet rayonnement, Traitement thermique, Spectre visible, Couche mince, Oxyde d'étain, Oxyde d'indium, Caractéristique courant tension, 8560D, 8107, 6180, 7361.
English descriptors
- KwdEn :
- Chemical coating, Ethylene naphthalate copolymer, Ethylene terephthalate polymer, Heat treatment, Indium addition, Indium oxide, Nanoparticle, Nanostructured materials, Photodiode, Printing, Radiation effect, Sheet resistivity, Thin film, Tin addition, Tin oxide, Visible spectrum, Voltage current curve.
Abstract
ITO (tin doped indium oxide) coatings were produced by gravure printing process on PET and PEN foils. The printing paste consists of ITO nanoparticles, which are dispersed in a solvent and mixed with a binder. By modification of the printing paste, the sheet resistance (R/sq) of the ITO coatings after hardening under UV-irradiation at low temperatures (< 130 °C) could be decreased to 1 kΩ/sq. R/sq could be further reduced down to 0.5 kΩ/sq by heat treatment under forming gas atmosphere (N2/H2), the transmission of the ITO coated foils still being more than 80% in the visible range. The application of these ITO films as a bottom electrode in organic photodiodes (OPDs) is shown, and the current density-voltage characteristics of the OPDs are presented.
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<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en" level="a">Wet chemical deposited ITO coatings on flexible substrates for organic photodiodes</title><author><name sortKey="Heusing, S" uniqKey="Heusing S">S. Heusing</name><affiliation wicri:level="3"><inist:fA14 i1="01"><s1>INM - Leibniz Institute for New Materials, Campus D2 2, D</s1><s2>66123 Saarbruecken</s2><s3>DEU</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>6 aut.</sZ></inist:fA14><country>Allemagne</country><placeName><region type="land" nuts="2">Sarre (Land)</region><settlement type="city">Sarrebruck</settlement></placeName></affiliation></author><author><name sortKey="De Oliveira, P W" uniqKey="De Oliveira P">P. W. De Oliveira</name><affiliation wicri:level="3"><inist:fA14 i1="01"><s1>INM - Leibniz Institute for New Materials, Campus D2 2, D</s1><s2>66123 Saarbruecken</s2><s3>DEU</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>6 aut.</sZ></inist:fA14><country>Allemagne</country><placeName><region type="land" nuts="2">Sarre (Land)</region><settlement type="city">Sarrebruck</settlement></placeName></affiliation></author><author><name sortKey="Kraker, E" uniqKey="Kraker E">E. Kraker</name><affiliation wicri:level="1"><inist:fA14 i1="02"><s1>JOANNEUM RESEARCH Forschungsgesellschaft mbH, Institute of Nanostructured Materials and Photonics, Franz Pichlerstrasse 30</s1><s2>8160 Weiz</s2><s3>AUT</s3><sZ>3 aut.</sZ><sZ>4 aut.</sZ><sZ>5 aut.</sZ></inist:fA14><country>Autriche</country><wicri:noRegion>8160 Weiz</wicri:noRegion></affiliation></author><author><name sortKey="Haase, A" uniqKey="Haase A">A. Haase</name><affiliation wicri:level="1"><inist:fA14 i1="02"><s1>JOANNEUM RESEARCH Forschungsgesellschaft mbH, Institute of Nanostructured Materials and Photonics, Franz Pichlerstrasse 30</s1><s2>8160 Weiz</s2><s3>AUT</s3><sZ>3 aut.</sZ><sZ>4 aut.</sZ><sZ>5 aut.</sZ></inist:fA14><country>Autriche</country><wicri:noRegion>8160 Weiz</wicri:noRegion></affiliation></author><author><name sortKey="Palfinger, C" uniqKey="Palfinger C">C. Palfinger</name><affiliation wicri:level="1"><inist:fA14 i1="02"><s1>JOANNEUM RESEARCH Forschungsgesellschaft mbH, Institute of Nanostructured Materials and Photonics, Franz Pichlerstrasse 30</s1><s2>8160 Weiz</s2><s3>AUT</s3><sZ>3 aut.</sZ><sZ>4 aut.</sZ><sZ>5 aut.</sZ></inist:fA14><country>Autriche</country><wicri:noRegion>8160 Weiz</wicri:noRegion></affiliation></author><author><name sortKey="Veith, M" uniqKey="Veith M">M. Veith</name><affiliation wicri:level="3"><inist:fA14 i1="01"><s1>INM - Leibniz Institute for New Materials, Campus D2 2, D</s1><s2>66123 Saarbruecken</s2><s3>DEU</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>6 aut.</sZ></inist:fA14><country>Allemagne</country><placeName><region type="land" nuts="2">Sarre (Land)</region><settlement type="city">Sarrebruck</settlement></placeName></affiliation></author></titleStmt><publicationStmt><idno type="inist">10-0167053</idno><date when="2010">2010</date><idno type="stanalyst">PASCAL 10-0167053 INIST</idno><idno type="RBID">Pascal:10-0167053</idno><idno type="wicri:Area/Main/Corpus">004755</idno><idno type="wicri:Area/Main/Repository">003575</idno></publicationStmt><seriesStmt><idno type="ISSN">0040-6090</idno><title level="j" type="abbreviated">Thin solid films</title><title level="j" type="main">Thin solid films</title></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Chemical coating</term><term>Ethylene naphthalate copolymer</term><term>Ethylene terephthalate polymer</term><term>Heat treatment</term><term>Indium addition</term><term>Indium oxide</term><term>Nanoparticle</term><term>Nanostructured materials</term><term>Photodiode</term><term>Printing</term><term>Radiation effect</term><term>Sheet resistivity</term><term>Thin film</term><term>Tin addition</term><term>Tin oxide</term><term>Visible spectrum</term><term>Voltage current curve</term></keywords><keywords scheme="Pascal" xml:lang="fr"><term>Revêtement chimique</term><term>Photodiode</term><term>Addition étain</term><term>Addition indium</term><term>Impression</term><term>Ethylène téréphtalate polymère</term><term>Ethylène naphtalate copolymère</term><term>Nanoparticule</term><term>Nanomatériau</term><term>Résistivité couche</term><term>Effet rayonnement</term><term>Traitement thermique</term><term>Spectre visible</term><term>Couche mince</term><term>Oxyde d'étain</term><term>Oxyde d'indium</term><term>Caractéristique courant tension</term><term>8560D</term><term>8107</term><term>6180</term><term>7361</term></keywords></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">ITO (tin doped indium oxide) coatings were produced by gravure printing process on PET and PEN foils. The printing paste consists of ITO nanoparticles, which are dispersed in a solvent and mixed with a binder. By modification of the printing paste, the sheet resistance (R/sq) of the ITO coatings after hardening under UV-irradiation at low temperatures (< 130 °C) could be decreased to 1 kΩ/sq. R/sq could be further reduced down to 0.5 kΩ/sq by heat treatment under forming gas atmosphere (N<sub>2</sub>/H<sub>2</sub>), the transmission of the ITO coated foils still being more than 80% in the visible range. The application of these ITO films as a bottom electrode in organic photodiodes (OPDs) is shown, and the current density-voltage characteristics of the OPDs are presented.</div></front></TEI><inist><standard h6="B"><pA><fA01 i1="01" i2="1"><s0>0040-6090</s0></fA01><fA02 i1="01"><s0>THSFAP</s0></fA02><fA03 i2="1"><s0>Thin solid films</s0></fA03><fA05><s2>518</s2></fA05><fA06><s2>4</s2></fA06><fA08 i1="01" i2="1" l="ENG"><s1>Wet chemical deposited ITO coatings on flexible substrates for organic photodiodes</s1></fA08><fA09 i1="01" i2="1" l="ENG"><s1>Transparent Conductive Oxides: TCO2008</s1></fA09><fA11 i1="01" i2="1"><s1>HEUSING (S.)</s1></fA11><fA11 i1="02" i2="1"><s1>DE OLIVEIRA (P. W.)</s1></fA11><fA11 i1="03" i2="1"><s1>KRAKER (E.)</s1></fA11><fA11 i1="04" i2="1"><s1>HAASE (A.)</s1></fA11><fA11 i1="05" i2="1"><s1>PALFINGER (C.)</s1></fA11><fA11 i1="06" i2="1"><s1>VEITH (M.)</s1></fA11><fA12 i1="01" i2="1"><s1>FORTUNATO (Elvira)</s1><s9>ed.</s9></fA12><fA12 i1="02" i2="1"><s1>LEE (Sang Yeol)</s1><s9>ed.</s9></fA12><fA12 i1="03" i2="1"><s1>VAYSSIERES (Lionel)</s1><s9>ed.</s9></fA12><fA14 i1="01"><s1>INM - Leibniz Institute for New Materials, Campus D2 2, D</s1><s2>66123 Saarbruecken</s2><s3>DEU</s3><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>6 aut.</sZ></fA14><fA14 i1="02"><s1>JOANNEUM RESEARCH Forschungsgesellschaft mbH, Institute of Nanostructured Materials and Photonics, Franz Pichlerstrasse 30</s1><s2>8160 Weiz</s2><s3>AUT</s3><sZ>3 aut.</sZ><sZ>4 aut.</sZ><sZ>5 aut.</sZ></fA14><fA15 i1="01"><s1>Materials Science Department/CENIMAT, Faculty of Sciences and Technology, New university of Lisbon, Campus da Caparica</s1><s2>2829-516 Caparica</s2><s3>PRT</s3><sZ>1 aut.</sZ></fA15><fA15 i1="02"><s1>Center for Energy Materials Research, Korea Institute of Science and Technology</s1><s2>Seoul 136-791</s2><s3>KOR</s3><sZ>2 aut.</sZ></fA15><fA20><s1>1164-1169</s1></fA20><fA21><s1>2010</s1></fA21><fA23 i1="01"><s0>ENG</s0></fA23><fA43 i1="01"><s1>INIST</s1><s2>13597</s2><s5>354000189339040310</s5></fA43><fA44><s0>0000</s0><s1>© 2010 INIST-CNRS. All rights reserved.</s1></fA44><fA45><s0>27 ref.</s0></fA45><fA47 i1="01" i2="1"><s0>10-0167053</s0></fA47><fA60><s1>P</s1><s2>C</s2></fA60><fA61><s0>A</s0></fA61><fA64 i1="01" i2="1"><s0>Thin solid films</s0></fA64><fA66 i1="01"><s0>NLD</s0></fA66><fC01 i1="01" l="ENG"><s0>ITO (tin doped indium oxide) coatings were produced by gravure printing process on PET and PEN foils. The printing paste consists of ITO nanoparticles, which are dispersed in a solvent and mixed with a binder. By modification of the printing paste, the sheet resistance (R/sq) of the ITO coatings after hardening under UV-irradiation at low temperatures (< 130 °C) could be decreased to 1 kΩ/sq. R/sq could be further reduced down to 0.5 kΩ/sq by heat treatment under forming gas atmosphere (N<sub>2</sub>/H<sub>2</sub>), the transmission of the ITO coated foils still being more than 80% in the visible range. The application of these ITO films as a bottom electrode in organic photodiodes (OPDs) is shown, and the current density-voltage characteristics of the OPDs are presented.</s0></fC01><fC02 i1="01" i2="X"><s0>001D03F15</s0></fC02><fC02 i1="02" i2="3"><s0>001B80A07Z</s0></fC02><fC02 i1="03" i2="3"><s0>001B60A80</s0></fC02><fC02 i1="04" i2="3"><s0>001B70C61</s0></fC02><fC03 i1="01" i2="3" l="FRE"><s0>Revêtement chimique</s0><s5>01</s5></fC03><fC03 i1="01" i2="3" l="ENG"><s0>Chemical coating</s0><s5>01</s5></fC03><fC03 i1="02" i2="X" l="FRE"><s0>Photodiode</s0><s5>02</s5></fC03><fC03 i1="02" i2="X" l="ENG"><s0>Photodiode</s0><s5>02</s5></fC03><fC03 i1="02" i2="X" l="SPA"><s0>Fotodiodo</s0><s5>02</s5></fC03><fC03 i1="03" i2="X" l="FRE"><s0>Addition étain</s0><s5>03</s5></fC03><fC03 i1="03" i2="X" l="ENG"><s0>Tin addition</s0><s5>03</s5></fC03><fC03 i1="03" i2="X" l="SPA"><s0>Adición estaño</s0><s5>03</s5></fC03><fC03 i1="04" i2="X" l="FRE"><s0>Addition indium</s0><s5>04</s5></fC03><fC03 i1="04" i2="X" l="ENG"><s0>Indium addition</s0><s5>04</s5></fC03><fC03 i1="04" i2="X" l="SPA"><s0>Adición indio</s0><s5>04</s5></fC03><fC03 i1="05" i2="X" l="FRE"><s0>Impression</s0><s5>05</s5></fC03><fC03 i1="05" i2="X" l="ENG"><s0>Printing</s0><s5>05</s5></fC03><fC03 i1="05" i2="X" l="SPA"><s0>Impresión</s0><s5>05</s5></fC03><fC03 i1="06" i2="X" l="FRE"><s0>Ethylène téréphtalate polymère</s0><s2>NK</s2><s5>06</s5></fC03><fC03 i1="06" i2="X" l="ENG"><s0>Ethylene terephthalate polymer</s0><s2>NK</s2><s5>06</s5></fC03><fC03 i1="06" i2="X" l="SPA"><s0>Etileno tereftalato polímero</s0><s2>NK</s2><s5>06</s5></fC03><fC03 i1="07" i2="X" l="FRE"><s0>Ethylène naphtalate copolymère</s0><s5>07</s5></fC03><fC03 i1="07" i2="X" l="ENG"><s0>Ethylene naphthalate copolymer</s0><s5>07</s5></fC03><fC03 i1="07" i2="X" l="SPA"><s0>Etileno naftalato copolimero</s0><s5>07</s5></fC03><fC03 i1="08" i2="X" l="FRE"><s0>Nanoparticule</s0><s5>08</s5></fC03><fC03 i1="08" i2="X" l="ENG"><s0>Nanoparticle</s0><s5>08</s5></fC03><fC03 i1="08" i2="X" l="SPA"><s0>Nanopartícula</s0><s5>08</s5></fC03><fC03 i1="09" i2="3" l="FRE"><s0>Nanomatériau</s0><s5>09</s5></fC03><fC03 i1="09" i2="3" l="ENG"><s0>Nanostructured materials</s0><s5>09</s5></fC03><fC03 i1="10" i2="X" l="FRE"><s0>Résistivité couche</s0><s5>10</s5></fC03><fC03 i1="10" i2="X" l="ENG"><s0>Sheet resistivity</s0><s5>10</s5></fC03><fC03 i1="10" i2="X" l="SPA"><s0>Resistividad capa</s0><s5>10</s5></fC03><fC03 i1="11" i2="X" l="FRE"><s0>Effet rayonnement</s0><s5>11</s5></fC03><fC03 i1="11" i2="X" l="ENG"><s0>Radiation effect</s0><s5>11</s5></fC03><fC03 i1="11" i2="X" l="SPA"><s0>Efecto radiación</s0><s5>11</s5></fC03><fC03 i1="12" i2="X" l="FRE"><s0>Traitement thermique</s0><s5>12</s5></fC03><fC03 i1="12" i2="X" l="ENG"><s0>Heat treatment</s0><s5>12</s5></fC03><fC03 i1="12" i2="X" l="SPA"><s0>Tratamiento térmico</s0><s5>12</s5></fC03><fC03 i1="13" i2="X" l="FRE"><s0>Spectre visible</s0><s5>13</s5></fC03><fC03 i1="13" i2="X" l="ENG"><s0>Visible spectrum</s0><s5>13</s5></fC03><fC03 i1="13" i2="X" l="SPA"><s0>Espectro visible</s0><s5>13</s5></fC03><fC03 i1="14" i2="X" l="FRE"><s0>Couche mince</s0><s5>14</s5></fC03><fC03 i1="14" i2="X" l="ENG"><s0>Thin film</s0><s5>14</s5></fC03><fC03 i1="14" i2="X" l="SPA"><s0>Capa fina</s0><s5>14</s5></fC03><fC03 i1="15" i2="X" l="FRE"><s0>Oxyde d'étain</s0><s5>15</s5></fC03><fC03 i1="15" i2="X" l="ENG"><s0>Tin oxide</s0><s5>15</s5></fC03><fC03 i1="15" i2="X" l="SPA"><s0>Estaño óxido</s0><s5>15</s5></fC03><fC03 i1="16" i2="X" l="FRE"><s0>Oxyde d'indium</s0><s5>16</s5></fC03><fC03 i1="16" i2="X" l="ENG"><s0>Indium oxide</s0><s5>16</s5></fC03><fC03 i1="16" i2="X" l="SPA"><s0>Indio óxido</s0><s5>16</s5></fC03><fC03 i1="17" i2="X" l="FRE"><s0>Caractéristique courant tension</s0><s5>29</s5></fC03><fC03 i1="17" i2="X" l="ENG"><s0>Voltage current curve</s0><s5>29</s5></fC03><fC03 i1="17" i2="X" l="SPA"><s0>Característica corriente tensión</s0><s5>29</s5></fC03><fC03 i1="18" i2="X" l="FRE"><s0>8560D</s0><s4>INC</s4><s5>71</s5></fC03><fC03 i1="19" i2="X" l="FRE"><s0>8107</s0><s4>INC</s4><s5>72</s5></fC03><fC03 i1="20" i2="X" l="FRE"><s0>6180</s0><s4>INC</s4><s5>73</s5></fC03><fC03 i1="21" i2="X" l="FRE"><s0>7361</s0><s4>INC</s4><s5>74</s5></fC03><fN21><s1>109</s1></fN21><fN44 i1="01"><s1>OTO</s1></fN44><fN82><s1>OTO</s1></fN82></pA><pR><fA30 i1="01" i2="1" l="ENG"><s1>International Symposium on Transparent Conductive Oxides (TCO2008)</s1><s2>2</s2><s3>Hersonissos, Crète GRC</s3><s4>2008-10-22</s4></fA30></pR></standard></inist></record>Pour manipuler ce document sous Unix (Dilib)
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